Influence of oxygen addition on the target voltage during reactive sputtering of aluminium. The surface morphology of al2o3 films was investigated using atomic force microscopy. All the films exhibit a transmission over 80% in the visible region. Hongrf magnetron sputtering aluminum oxide film for surface passivation on crystalline. Yttrium aluminum oxide is a highly insoluble thermally stable yttrium source suitable for glass, optic and ceramic applications. Table 1 summarizes the voltages of each output and microarc level microarcsec for 5% and 50% boost for sputtering aluminum target in both metal and oxide modes.
The plasma has a plasma sheath of a known thickness during sputtering under a selected sputtering environment. The conductivity of the wire is relative to the oxygen level. Due to its high reactivity, it is rarely found in nature as a free element. Aluminum oxide sputtering target from stanford advanced materials contains al and o, and it has the same properties as aluminum oxide. In addition, sputter deposition using a sio 2 or al 2o 3 target may cause a large temperature rise of the substrate, leading to its deformation when high throughput is required. The azo films were prepared by rf magnetron sputtering at room temperature and postannealed at 500 c in a vacuum. Our oxide sputtering targets offer a better yield, process stability and more design freedom for the optical coating engineer. What are the factors for aluminum thin film depostion when. Pvd materials sputtering targets, pellets, slugs, starter charges, crucibles. The substrates were ultrasonically cleaned in isopropanol for 10 minutes and dried with nitrogen gas. This method includes providing a sputtering apparatus having an argon plasma.
In order to maintain a stable deposition process and high deposition rate, a pulsed direct current bias was applied to the aluminum target and the substrate. The sputtering yield of aluminum oxide during reactive magnetron sputtering has been quantified by a new and fast method. Pdf aluminum oxide thin films were deposited on pet substrate film using r. Rod, tube, pieces and wire target bonding services recycling of precious metal scrap pure elements noble metals aluminum, al antimony, sb beryllium, be bismuth, bi boron, b cadmium, cd. American elements specializes in producing high purity copper aluminum oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition cvd and physical vapor deposition pvd display and optical applications.
Compared with the target prepared by conventional raw materials, the performance of the optimized al. An external solenoid was used to form a magnetic trap between the target. Product name opper aluminum oxide ualo2 sputtering targets hemical formula ualo2 as number 12042921 qsam supplier item code dpox29st product type oxide ceramics purity range 99. The target sputtering power and substrate bias voltage were varied from 4 to 8 kw and 80 to 180 v, respectively. Review sputtering gun manual to determine appropriate target size.
Hysteresis curves for a mass deposition rate of zirconium oxide, b target voltage, and c partial pressure of oxygen as a function of oxygen. Sputtering deposition, or sputter coating, is one of the physical vapor deposition technology, whereby sputtering target particles are ejected from a solid sputtering material due to bombardment of the target by energetic particles. Reactive sputtering of aluminum oxide in a planar magnetron system is conducted with a mixture of o and ar reacting with 2 and bombarding an aluminum target. The aluminum oxide films were prepared by rf magnetron sputtering. Pdf in magnetic head recording storage, al2o3 film was deposited onto al2o3 tic. Sputter deposited aluminium oxide for superconducting high kinetic inductance circuits. Oxide ceramic sputtering targets are the most common ones among advanced ceramic sputtering targets. Aluminum oxide, or more commonly called alumina, is a chemical compound with a chemical formula of al2o3. Influence of oxygen addition on the target voltage during. About aluminum oxide sputtering target american elements specializes in producing high purity aluminum oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition cvd and physical vapor deposition pvd display and optical applications. Rotatable sputtering targets for high performance aldoped zn oxide coatings. The method is based on the meticulous determination of the reactive gas.
Us7087142b2 method for determining a critical size of an. Zinc oxide with alumina sputter target azo sputtering. The electrical resistivity of the film strongly depends on the substrate temperature, substrate to target distance and orientation of the substrate. Excellent alloy sputtering target manufacturer and supplier. Al2o3 thin film deposited by magnetron sputtering ms at low temperature. Ceramic oxide sputtering targets for sale, target plate.
Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. The target material or cathode which is to become the thin film coating is bombarded by these high energy ions sputtering off atoms as a fine spray covering the substrate to be coated. Although it is not a strong material, it is a good conductor of heat and electricity and is able to form an oxide layer that is resistant to corrosion. Lanthanum aluminum oxide sputtering target american. The properties of the prepared azo films were then investigated. The aluminum target is powered by a pulsed directed current dc bias which functions to. The higher sputter rate of aluminum metal allows for. Hysteresis curve for reactive sputtering of aluminum oxide, presented as reactive gas flow rate versus sputter pressure. Google patents the sputtering target and the oxide semiconductor film. Practical limitations for the bipolar pulse sputtering of. Oxide ceramics can be made by sintering at high temperature with one or more oxides being the main principal components and other minor oxides being the additives.
Materion manufactures specialty cigs materials to support. What are the factors for aluminum thin film depostion when rf sputtering is used. Lowtemperature magnetron sputterdeposition, hardness. Target voltage hysteresis behavior and control point in the. Sams aluminum sputter targets, with high quality and competitive price, are widely used for semiconductor, chemical vapor deposition cvd and physical vapor deposition pvd display and optical applications. Anodization of sputtered substoichiometric aluminum oxide thinfilms for improved nanorod array fabrication.
Sputtering targets oxides evochems product program contains a wide range of oxide sputtering targets optimized for the special requirements of sputtering processes. Preparation of aluminum doped zinc oxide targets and rf. Our targets and cathodes made from titanium aluminum tial ensure that drills, milling machines, indexable cutting inserts and other tools are protected by a hard, oxidationresistant nitride coating tialn. Main properties of al2o3 thin films deposited by magnetron. Aluminum oxide sputtering target american elements. Find product data for thin film depositions sputtering targets.
Zno sputtering target was prepared by cold isostatic pressing cip using nanostructured zinc oxide powder and aluminum oxide powder as raw material. Undoped zinc oxide and aluminum doped zinc oxide films were prepared by rf magnetron sputtering of presynthesised target. Yttrium aluminum oxide sputter target yttrium aluminum. Yttrium aluminum oxide sputtering target american elements. It is an electronic process that deposits thin films of metals or other materials onto a variety of surfaces. Formation process of al2o3 thin film by reactive sputtering. We supply all kinds of alloy sputtering targets for the world.
They are divided into simple oxide ceramics and complex oxide ceramics. Reactive sputtering of aluminum oxide in a planar magnetron system is conducted with a mixture of o2 and ar reacting with and bombarding an aluminum target. Industrially, this element does not constitute an important health hazard. Anomalous effects in the aluminum oxide sputtering yield. Azo sputtering target alumina doped zinc oxide is a transparent conductive oxide commonly used as a transparent electrode for solar photovoltaic applications and in large area architectural glass coating. The method is based on the meticulous determination of the reactive gas consumption during reactive dc magnetron sputtering and has been deployed to determine the sputtering yield of aluminum oxide.
As with dc sputtering, rf sputtering runs an energetic wave through an inert gas in a vacuum chamber which becomes ionized. Transparent conducting zinc oxide thin film prepared by. The design and modification of a sputter system for dc. Dual magnetron sputtering of aluminum and silicon oxides. Since aluminum oxide is a source of contamination during the. Oxide sputtering targets often need to be bonded to a metallic carrier. The present invention relates to a method for determining a critical size for a diameter of an al 2 o 3 inclusion 38 in an al or al alloy sputter target 42 to prevent arcing during sputtering thereof. When evaporated in a vacuum, aluminum layers form a reflective coating. Alloy sputtering targets for sale, alloy target plate.
About yttrium aluminum oxide sputtering target american elements specializes in producing high purity yttrium aluminum oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition cvd and physical vapor deposition pvd display and optical applications. Sputtering target for architecture glass, solar and other. Some of the commonly known synonyms of yttrium aluminum oxide are yttrium aluminate, yttrium aluminum garnet, aluminum yttrium oxide, ceralox and aluminum yttrium garnet. Our materials listing page includes metals, composition, sputtering targets, ebeam sources, evaporation materials, purities, and msds. Because of the lower sputter voltage asymmetry between the a and b output and the lower. As aluminum oxide is relatively difficult to sputter, deposition. We provide gold au, platinum pt, palladium pd, silver ag, iridium ir, ruthenium ru, rhodium rh, and tantalum ta targets and a variety of custom alloys and composite. Sputtering targets, sputtertargets, sputtertarget oxides. Anodization of sputtered substoichiometric aluminum oxide. Electrical properties of thin rf sputtered aluminum oxide. Pdf anomalous effects in the aluminum oxide sputtering yield. Disclosed is a sputtering target containing an oxide of indium in, gallium ga and zinc zn, which specifically contains a compound expressed as znga2o4 and a compound expressed as ingazno4. Sputtering targets product data thin film deposition materion. We also provide inhouse sputter target bonding and precious metals reclamation services, saving you both time and money.
To the best of our knowledge the chemical, physical and toxicological properties of vanadium oxide solid have not been thoroughly investigated and recorded. Pdf xps study of aluminum oxides deposited on pet thin film. Sputtering targets vacuum engineering and materials co. Enhancement of aluminum oxide physical vapor deposition. By using our wellestablished supplier network, we can offer sputtering targets for your application. Each sputtering target and evaporation material ships complete with a certificate of analysis and sds. Aluminum oxide, al2o3 antimony oxide, sb2o3 barium oxide. We will contribute to your effort to reduce manufacturing cost without sacrificing quality.
Quken provides a wide range of oxide sputtering targets to meet your composition, shape and purity requirements. Copper aluminum oxide sputtering target american elements. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Many studies exist for the hysteresis behavior of the target voltage, but most of them use manual. Main properties of al 2 o 3 thin films deposited by magnetron sputtering of an al 2 o 3 ceramic target at different radiofrequency power and argon pressure and. The higher sputter rate of aluminum metal allows for higher deposition rates. Dual target inverted cylindrical sputtering system in. The results showed that both elastic and hardness of al2o3 films increased with the increase of target sputtering power. About lanthanum aluminum oxide sputtering target american elements specializes in producing high purity lanthanum aluminum oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition cvd and physical vapor deposition pvd display and optical.
665 1105 870 708 1129 560 170 1273 1472 1419 514 1441 692 1310 1001 138 4 1196 1002 783 796 457 947 947 471 210 1107 597 1451 213 1448 430 754